Process Setup and Optimization • LithExx-Systems

Process Setup and Optimization

We support customers implementing or optimizing their lithographic processes

Setup of Lithographic Processes

Generation of Spin Curve to check the resist film thickness range
Generation of Swing Curve to defined the optimum resist film thickness for the desired application
Evaluation of various process parameters to define optimum setting for maximum process window (FEM)
Consideration of customer specific requirements

Swing Curve Plot

FEM of Resist Plot

Process Optimization

Optimization of coating parameters to achieve maximum resist film uniformity
Optimization of developing parameters to achieve maximum CD-uniformity
Reduction of media consumption such as resists, polyimides, PBOs, solvents, developers, ...
Optimization of process times to generate maximum throughput

Resist Thickness Uniformity Plot

CD Uniformity Plot

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LS-hmds-priming-system

LS Series

LS-alpha-series

LS HMDS Priming Tool

LS HMDS Priming Tool

Canon Shutter Unit Repair

Ls Series

LS Series

LS Series

LS Series

LS Alpha Series

Handler for Foils

CD Uniformity Plot

LS Foil Processing

Located

Technologiepark Villach
Europastrasse 8
9524 Villach
Austria – Europe

E-Mail

office@lithexx-systems.com

Phone

+43 4242 30848

FAX

+43 4242 30848-10