Process Setup and Optimization

We support customers implementing or optimizing their lithographic processes

Setup of Lithographic Processes

  • Generation of Spin Curve to check the resist film thickness range
  • Generation of Swing Curve to defined the optimum resist film thickness for the desired application
  • Evaluation of various process parameters to define optimum setting for maximum process window (FEM)
  • Consideration of customer specific requirements

Process Optimization

  • Optimization of coating parameters to achieve maximum resist film uniformity
  • Optimization of developing parameters to achieve maximum CD-uniformity
  • Reduction of media consumption such as resists, polyimides, PBOs, solvents, developers, ...
  • Optimization of process times to generate maximum throughput